Award Abstract #0102648
NER: Combined NIL and ESA Processing of Electro-Optic Materials

NSF Org:	CMMI Division of Civil, Mechanical, and Manufacturing Innovation
Initial Amendment Date:	August 6, 2001
Latest Amendment Date:	August 6, 2001
Award Number:	0102648
Award Instrument:	Standard Grant
Program Manager:	Ken Chong CMMI Division of Civil, Mechanical, and Manufacturing Innovation ENG Directorate for Engineering
Start Date:	August 1, 2001
Expires:	January 31, 2003 (Estimated)
Awarded Amount to Date:	$100000
Investigator(s):	Richard Claus roclaus@nanosonic.com (Principal Investigator)
Sponsor:	Virginia Polytechnic Institute and State University 1880 Pratt Drive BLACKSBURG, VA 24060 540/231-5281
NSF Program(s):	MECHANICS OF MATERIALS, ELECT, PHOTONICS, & DEVICE TEC
Field Application(s):	0106000 Materials Research, 0308000 Industrial Technology
Program Reference Code(s):	AMPP, 9161, 1676
Program Element Code(s):	1630, 1517

ABSTRACT

ABSTRACT

NSF Proposal #0102648

Combined NIL and ESA Processing of Electro-Optic Materials

Richard O. Claus, Virginia Tech, PI

This NSF NER program will study polymer/dielectric nanocomposites with enhanced electro-optical modulation efficiency and thermal stability, by using a combination of electrostatic self-assembly (ESA) facilities at Virginia Tech and nanoimprint lithography (NIL) facilities at the University of Michigan. We will use NIL to create a base nanopatterned template and ESA to fill in the template through the molecular-level assembly of dipolar molecules. This combination of approaches would allow the potentially low-cost manufacturing of optical and electro-optic materials and devices. The program will allow us to explore fundamental issues involving nanopatterning, molecular alignment, and structure/property relationships in resulting prototype device materials.

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