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Award Abstract #0209556
NER: Development of a Novel Low Cost Nano-lithography Technique using a Nanometric High Transmission Optical Antenna


NSF Org: CMMI
Division of Civil, Mechanical, and Manufacturing Innovation
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Initial Amendment Date: July 24, 2002
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Latest Amendment Date: July 24, 2002
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Award Number: 0209556
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Award Instrument: Standard Grant
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Program Manager: Kevin Lyons
CMMI Division of Civil, Mechanical, and Manufacturing Innovation
ENG Directorate for Engineering
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Start Date: July 15, 2002
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Expires: June 30, 2003 (Estimated)
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Awarded Amount to Date: $100000
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Investigator(s): Xianfan Xu xxu@ecn.purdue.edu (Principal Investigator)
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Sponsor: Purdue University
Young Hall
West Lafayette, IN 47907 765/494-4600
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NSF Program(s): NANOSCALE: EXPLORATORY RSRCH,
THERMAL TRANSPORT PROCESSES
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Field Application(s): 0308000 Industrial Technology
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Program Reference Code(s): MANU, 9146, 1788, 1676, 1406
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Program Element Code(s): 1676, 1406

ABSTRACT

This project was received in response to Nanoscale Science and Engineering initiative, NSF 01-157, category NER. The objective of this project is to develop a novel low cost nano-lithography technique. Conventional nano-manufacturing equipment, using electron beams or other radiation sources and operating in vacuum, costs well above $1,000,000. In contrary, this technique is based on a laser device and its accessories; its total cost will be less than $100,000. The key component in this nano-lithography system is a nanometric optical antenna capable of transmitting an incoming micrometer size laser beam into a nanometer size domain with high transmissivity (efficiency). This nano-lithography system can be further developed into a parallel manufacturing system, so that the time needed for the manufacturing process can be significantly reduced compared with other techniques.

With the rapid progress in nano-technology, it is crucial to develop low cost manufacturing techniques with high throughput. Only with rapid and low cost manufacturing techniques could the nano-technology translate itself from research to industry, and to impact the society. The success of this work will provide a low cost nano-lithography technique for nano-manufacturing. This research will also provide training to undergraduate and graduate students, including underrepresented groups. The results of this research will be broadly disseminated.

 

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Last Updated:April 2, 2007