Award Abstract #0210357
NER: Atomic Lithography of Arbitrary Two-Dimensional Nanostructures

NSF Org:	PHY Division of Physics
Initial Amendment Date:	August 20, 2002
Latest Amendment Date:	August 20, 2002
Award Number:	0210357
Award Instrument:	Standard Grant
Program Manager:	C. Denise Caldwell PHY Division of Physics MPS Directorate for Mathematical & Physical Sciences
Start Date:	August 15, 2002
Expires:	January 31, 2004 (Estimated)
Awarded Amount to Date:	$70000
Investigator(s):	Mark Saffman msaffman@wisc.edu (Principal Investigator)
Sponsor:	University of Wisconsin-Madison 21 North Park Street MADISON, WI 53715 608/262-3822
NSF Program(s):	DMR SHORT TERM SUPPORT, PHYSICS-OTHER
Field Application(s):	0000099 Other Applications NEC
Program Reference Code(s):	OTHR, MANU, 9147, 1767, 1710, 1676, 1248, 0000
Program Element Code(s):	1712, 1248

ABSTRACT

This proposal was received in response to NSE, NSF 01-157. The project focuses on the development of a new approach to structured atomic deposition and lithography. Lithography using neutral atom beams focused by standing wave light fields shows great promise for nanoscale fabrication. However, the method has so far been limited to the production of spatially periodic patterns, which greatly limits the versatility of the technique. In this new approach a new method of synthesizing light induced lenses which permit the creation of a single localized spot at an arbitrary position in the plane will be used. The spot can be scanned without mechanical motion using spatial light modulators, such that arbitrary two-dimensional patterns can be generated. The project is jointly funded by the Divisions of Physics and Materials Research in the Mathematical and Physical Sciences Directorate.

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