Award Abstract #0210543
NIRT: Motion control platform for accurate measurement and manufacturing of nanostructures

NSF Org:	CMMI Division of Civil, Mechanical, and Manufacturing Innovation
Initial Amendment Date:	July 31, 2002
Latest Amendment Date:	July 31, 2002
Award Number:	0210543
Award Instrument:	Standard Grant
Program Manager:	Charalabos H. Doumanidis CMMI Division of Civil, Mechanical, and Manufacturing Innovation ENG Directorate for Engineering
Start Date:	August 1, 2002
Expires:	July 31, 2006 (Estimated)
Awarded Amount to Date:	$771500
Investigator(s):	Stuart Smith stusmith@uncc.edu (Principal Investigator) David Trumper (Co-Principal Investigator) Robert Hocken (Co-Principal Investigator)
Sponsor:	University of North Carolina at Charlotte 9201 University City Boulevard CHARLOTTE, NC 28223 704/687-2291
NSF Program(s):	WESTERN EUROPE PROGRAM, NANOSCALE: INTRDISCPL RESRCH T
Field Application(s):	0308000 Industrial Technology
Program Reference Code(s):	MANU, 9146, 5950, 5936, 1788, 1674
Program Element Code(s):	5980, 1674

ABSTRACT

This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 01-157, category NIRT. Nano-scale positioning and control technology will be essential both for nanotechnology research instrumentation and for tools dedicated to fabrication and testing of nano-devices, but few, if any, robust and reproducible solutions exist. To realize manufacture of macroscopically useful systems, it is necessary to have mechanisms with geometric precision and accuracy to facilitate the transition from nano-science to productive nanotechnology. This will be particularly important for multi-process manufacture and assembly of complexly shaped mechanisms. The objective of this project is to produce a portable and accurate instrument for sample/probe motion that is capable of performing at nanometer levels over protracted time periods. The output of this work will be a compact and highly integrated instrument, capable of reproducibly positioning a macro-sized object such as a silicon wafer over the complete scan area of 50 mm x 50 mm and return to a specified position thereby enabling observations of processes containing nanometer-sized objects as well as the ability to 'pick and place' for multi-component assembly. The instrument would enable nanometer resolution tools to focus on a nano-device placed anywhere over the instruments operating range for applications such as imprint lithography, lithographic self assembly, nanowire circuitry and complex multi-process and multi-scale assemblies.

This development will provide a facility for nanotechnology studies in all fields for which fundamental measurements at the limits of current technological capability are an issue, in particular, in the fields of bio-mechanics, nano-electronics and nano-mechanics. Training of future engineers in the emerging field of instrument and machine design for nanotechnology applications will take place both during the development of the instrumentation systems and through subsequent projects and graduate instruction based around the developed facility. It is also envisaged that knowledge of architectures for nanometer mechanism design will be incorporated into graduate precision machine design courses. A new graduate course titled 'Mechanical systems for nanotechnology' is currently being developed and will be offered in the 2002 fall semester. Additionally, a project web-site will be developed that will include links to logistical and technical discussion pages specific to this project as well as links to related sites. As part of our outreach to the k-12 community there will be a section providing an overview of this work aimed towards high school level readership.

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