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New Technique Makes It Easier to Etch Semiconductors


December 22, 2011

metal-assisted chemical etching Creating semiconductor structures for high-end optoelectronic devices just got easier, thanks to University of Illinois researchers. The team developed a method to chemically etch patterned arrays in the semiconductor gallium arsenide, used in solar cells, lasers and other optoelectronic devices. Unlike other wet methods, metal-assisted chemical etching works in one direction, from the top down, without damaging the surface like dry etching does. Full Story

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University of Illinois at Urbana-Champaign

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